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31. A second was to improve printability of feature sizes is to increase the numerical aperture (NA) of the lithographic imaging tool, with water immersion lithography currently being used.

32. A process for printing from a smooth surface, as lithography offset.

33. In popular IC manufactory system, Lithography is the most valuableness and critical process.

34. Electron - beam lithography with a novel multilevel resist structure defines the pattern.

35. Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.

36. Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.

37. Nano - imprint lithography drum paper teeth or wear parts.

38. This paper describes the development of phase shifting lithography and its applications in ULSI technology.

39. Thus it is the reasonable basis to put forward extending the waterless lithography printing in China.

40. Nikon and rival ASML Holding NV are going toe-to-toe in lithography,(www.Sentencedict.com) but the two the companies have markedly different strategies.

41. In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.

42. Compact Plasma Focus (CPF) device (NX2) operating in neon with high performance and high repetition rate is developed and used as an intense Soft X-Ray (SXR) source for microelectronics lithography.

43. This significant advance in lithography provides increased depth of focus and improved image fidelity that can improve chip-level performance and manufacturing efficiency.

44. The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.

45. The principles of LIGA process on mask, X ray lithography, electroform and model were analyzed.

46. Lithography - engraving by expasivity monlchamus in print , on behalf of the surface is a lithograph.

47. The FIR filter used in the power supply of submicron E beam lithography system is described.

48. In the manufacture process of integrated circuit(IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.

49. A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure.

50. Solution: fine - tune gripper teeth pad with Nano - imprint lithography drum edge.

51. Needle etching, lithography and gravure gravure business card printing belongs to and membership card.

52. The new source function was used to build a new lithography model based on SPLAT.

53. Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.

54. A process for printing from a smooth surface, as lithography or offset.

55. Lithography business card printing and membership card to make an indirect business card printing and membership card.

56. Durable , white, water - resistant, low shrinkage resin for stereo lithography for SLA system.

57. In this paper, the present, the existing problem and the prospect for the maskless lithography technology are introduced.

58. Based on lithography technology , the electrochemical lamella machining ( ECLM ) by frequency group pulses was experimentally studied.

59. Lithography - The process used to transfer patterns onto wafers.

60. 'Artist Degrees - Mecca or Manhattan' is a composition of six images which combine painting with a number of serial techniques that are inspired by photogravure and lithography.